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Sharing of processing methods of tellurium copper electropla

Author:mart Release time:2019-12-13 Page View:19
Tellurium copper is a very suitable heat conducting and conductive material for processing, but some processing technologies are not so simple. It is

 Tellurium copper is a very suitable heat conducting and conductive material for processing, but some processing technologies are not so simple. It is very difficult to electroplate tellurium copper. It is believed that people who use electroplate to process Copper know that this is a test of technology and caution in the electroplating process.


There are many ways to electroplate copper telluride in the process. One of them is water plating. The film thickness of water coating is thicker than that of vacuum splash plating, and different colors will be produced due to different chemical solutions of water coating. There are also vacuum plating, the target of vacuum plating has different coating color, vacuum plating power, vacuum level will have different color changes. However, there is also a kind of spatter plating, that is, the target material is bombarded with argon ion, the target atoms are knocked out into gas phase, and the coating is precipitated on the substrate. Splash plating has a wide range of characteristics, almost any material can be used in the analysis plating.

There are so many kinds of copper telluride. As long as we choose electroplating method, we must consider a series of factors and problems, such as the element composition, hardness, plasticity and so on. These factors are likely to lead to a series of problems such as cracks and loopholes in the processing of electroplated copper.

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